News

High Resolution: CFL can produce nanostructures with feature sizes down to sub-100 nanometers, making it suitable for fabricating high-resolution patterns for various applications. Low Cost: Compared ...
KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of ...
Membrane preparation: A thin SiN or Si membrane is created using standard microfabrication techniques, such as low-pressure chemical vapor deposition (LPCVD) or silicon-on-insulator (SOI) wafer ...
Advantages of X-Ray Lithography High Resolution: Due to the much shorter wavelength of X-rays than visible light, X-ray lithography achieves higher resolution than traditional lithography techniques.
Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required ...
Multibeam Corp. today announced that it has raised $31 million in Series B funds from global investors led by Onto Innovation Inc. (NYSE: ONTO), a leader in process control solutions for advanced ...
A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. Abstract “For higher computing ...
Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML -imec High NA EUV Lithography Lab in Veldhoven, the Netherlands ...
ASML's exciting new Twinscan EXE High-NA EUV lithography machines feature projection optics with a 0.55 numerical aperture that can achieve a resolution of down to 8nm with a single exposure.
High-NA EUV lithography makes it possible to form fine patterns on silicon wafers with a higher resolution than previously possible, and is expected to lead to the realization of high-performance ...